Clean Equipment Design & Development Advanced Engineering for Contamination-Controlled Environments

Systematic Clean Equipment Design

Engineered for Ultra-Clean Advanced Manufacturing

In advanced process nodes and high-purity applications, equipment itself can become a potential contamination source.

Our clean equipment design philosophy starts with Prevention, combined with high-efficiency Removal, delivering stable, repeatable, and quantifiable clean solutions for critical manufacturing environments.


Design Philosophy

Low Contamination × High Stability × Scalable for Production

Low Contamination Generation

All materials and structural designs prioritize minimizing particle generation, extractables, and cross-contamination risks.

Predictable Cleaning Performance

Every cleaning operation is engineered to correspond to measurable parameters such as flow rate, pressure, and processing time — ensuring reproducibility.

Semiconductor-Grade Implementation

From the design phase, we consider mass production stability, process compatibility, and long-term operational reliability.


Core Design Technologies

Material & Structural Engineering

  • Wetted materials: PFA / PTFE / PVDF

  • Dead-zone-free flow paths

  • Rounded internal geometries to prevent particle accumulation

  • Easy-drain, maintenance-friendly modular design


Fluid & Piping Engineering

  • Stable flow field design to prevent turbulence and particle re-adhesion

  • No sharp bends or sudden contractions in piping

  • Real-time monitoring of flow rate and pressure

  • Optimized pipeline routing for contamination control


Integrated Microbubble Cleaning Technology

  • Controlled microbubble size (10–50 µm)

  • Removal of contaminants through interfacial energy differential and micro-shear forces

  • Low temperature operation

  • Reduced chemical consumption

  • Minimal material stress

Applicable for:

  • FOUP cleaning

  • Filter housings

  • High-purity components

  • Critical clean assemblies


Control & Automation

  • Modular parameter configuration

  • Recipe-based management

  • Repeatability validation capability

  • PLC / HMI integration support

  • Data logging and traceability


Target Contaminant Removal

  • Particles

  • Organic films

  • Precursor residues

  • Molecular contamination sources


Our Value

We do not simply provide equipment —
We deliver contamination-engineered systems that processes can trust.

Through the integration of advanced materials, fluid engineering, process control, and precision cleaning technology, we help customers:

  • Reduce contamination risks

  • Improve process stability

  • Enhance yield consistency

  • Support long-term operational reliability